Workshop: Fundamentals of ALD
Workshop on Fundamentals of Atomic Layer Deposition: Modelling and Validation
July 3rd 2019, TU Delft, The Netherlands
We are excited to announce a one day workshop at TU Delft on modelling and experimental analysis of ALD processes. We are hosting an international group of invited speakers who will present simulation and experimental work on fundamentals and applications of ALD.
The workshop includes five invited sessions, one lecture on simulating ALD, lunch and a poster session.
Students are encouraged to bring posters to present their research to the community.
- Date: July 3rd, 2019
- Place: TU Delft - Department of Chemical Engineering,
building 58, room B2.100, Van der Maasweg 9, 2629 HZ, Delft
- Registration is free but required.
- Organizers: Fatemeh Hashemi, Ruud van Ommen
- For questions regarding the workshop please contact: Fatemeh Hashemi (email@example.com)
9:30-9:45 Opening and welcome
Fatemeh Hashemi (TU Delft, The Netherlands)
9:45-10:25 Session 1: Surface coverage in ALD
Riikka Puurunen (Aalto University, Finland)
10:25-11:05 Session 2: ALD of nanostructures
Simulation: Fabio Grillo (ETH, Switzerland)
Experiment: Damiano La Zara (TU Delft, The Netherlands)
11:05-11:45 Session 3: Area-selective ALD
Simulation: Esteban Marques (IMEC, Belgium)
Experiment: Job Soethoudt (IMEC, Belgium)
11:45-1:15 Lunch + Poster Session
1:15-2:30 Mini Lecture by Angel Yanguas-Gil (Argonne National Lab., USA)
“From nanoscience to nano-manufacturing: a simulation approach to understanding throughput and conformality of atomic layer deposition”
2:30-3:10 Session 4: ALD of 2D materials
Simulation: Mahdi Shirazi (TU Eindhoven, The Netherlands)
Experiment: Shashank Balasubramanyam (TU Eindhoven, The Netherlands)
3:10-3:50 Session 5: ALD for photocatalytic reactions
Simulation: Stephen Rhatigan (Tyndall, Ireland)
Experiment: Hamid Zafarani (TU Delft, The Netherlands)