FirstNano
Apparatus |
| FirstNano EasyTube2000 |
Supplier | FirstNano | |
Location | P00.350 | |
Main purpose | CVD of CNT’s and Graphene | |
System layout | Tube with peddle loader, Quartz Reaction Chamber | |
Gasses | H2, CH4, C2H4, Ar | |
Process information | deposition of CNTs and graphene at max. 1100°C | |
Facilities | ||
Specimen | max. 3 inch wafer, small pieces allowed | |
Equipment owner | Roald van der Kolk +31 634321301
Charles de Boer (back-up) +31 652169001 |