Plassys
Apparatus | MEB 550 evaporation system | |
Supplier |
| Plassys |
Location | P.00.390 | |
Main purpose | Evaporation | |
System layout | evaporation by e-beam heating (6x 15cc crucible liners) | |
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Process information | “standard” materials: Ti, Pd, Nb, Al, AlOx (reactive) | |
Facilities | Sample can be turned in two degrees of freedom for deposition of junctions. This capability is also included for ion etching. During deposition and oxidation the substrate stage can be cooled with liquid nitrogen. | |
Specimen | max. 100mm wafer, small pieces allowed | |
Equipment owner | Bas van Asten |