Training

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This training is intended for Master students and short term guest researchers that need to process only one type of Flow Chart on a limited number of equipment and whose stay is time limited.
During a 2 week session the trainer will process together with the user a dedicated run and show the basic equipment operation (demonstration, step-by-step talk and competence testing), proper usage of the tools and some “do’s” and “don’ts”.
Duration: 2 weeks. 

This training is intended for PhD students, industrial partners, new technical staff members and guest researchers.

During a 2 week session the trainer will show the basic operation and proper usage of the tools. The “hands-on” training course is designed for small groups of no more than three students. The background of the students is taken into consideration along with their future fields of research when defining the training run. 
All knowledge transfer takes place in practical clean-room situations. All steps, from the initial wafer preparation to the last interconnect metallization, are performed by the students under guidance. 
After the training run the user is entrusted to independently process the diploma run which is most of the times associated with his own research. The user organizes his own processing schedule and must finish his run in a reasonable short time (max. 2 weeks). Also the user will develop skills for cooperation within the clean-room community.

Topics
The basics of IC Technology, Clean room procedures, Clean room ethics, Use and understanding of standard process equipment, Use and understanding of standard in-line measurement equipment, On-chip electrical characterization, Making flowcharts.

Duration: 4 weeks.

For MEMS specific training not all equipment or processes are covered in the advanced process training. Also sometimes only training on a few apparatus or processes is needed. In that case a module training is offered: training on a specific piece of equipment or in a specific process. 
If more than 5 modules are needed then the advanced process training has to be followed.

For each equipment the training is on as-needed base and is offered at least once per week for complex modules and generally two times per week for the rest.
The amount of time it takes to become trained on a tool will vary depending on the complexity of the tool and the process, as well as on your experience. The user is encouraged to bring his own sample to the training sessions.
Duration: 2-4 hours per module.

For working with non-IC compatible materials special work flows are taught to prevent contamination of the process line. This course is an integral part of the Advanced Process and Advanced Module training, but can be taken separately also.
Duration: 4 hours.

Flow support
This service helps transferring a customer’s idea to a flowchart. Together with the customer a flowchart is made with the most updated process steps. Flow support provides suggestions, potential solutions, and tries to use as much as possible standardized EKL process steps to increase the chance of success.

This course is targeted at Post BSc level semiconductor industry professionals. 

Topics
Lithographic process flow, Impact of lithographic errors on bipolar and CMOS device parameters, Relation to other important process technologies like etching and metallization.
A complete CMOS process flow is considered with emphasis on the lithographic consequences.
The course is divided in 60% theory and 40% practice to support the theory
Duration: 1 week full time. 

This course is targeted at Post BSc level semiconductor industry professionals. 

Topics
Processing and equipment used in device fabrication, MOS-transistor and the Bipolar transistor, Impact of each technology on device integration and yield, Relation between process equipment and device fabrication of a CMOS process flow.
In the lab the last 4 process steps of a 5-mask level BiCMOS test circuit
are performed.
Discussion of measured device characteristics
Duration: 1 week full time. 

Courses on special topics can be tailor-made.