Fatemeh Hashemi

Alternative Precursors for Atomic Layer Deposition (CALDERA)

Many of the today's commonly-used ALD processes rely on the use of expensive and dangerous precursors. Moreover, moving from the ALD processes used in lab scale to the production scale requires alternative reactor designs and precursors. In collaboration with several other world-leading experts (in industry and academia), we aim to design safe and large-scale ALD processes. As a student, you will be working on developing these ALD processes and testing the applications of the deposited films in different systems.

Here you can find my recent publication list.

Dr. F.S. Minaye Hashemi