SSI

Apparatus

    

Rapid Thermal Annealer (RTA)

Supplier

  

Solaris

Location

  

P.00.350

Function

  

Heat treatment of Silicon substrates

System Specifications

  

Halogen lamps heated chamber. N2, Ar and forming gas (N2/10%H2) available. Max. ramp: 1000C/ second

Chuck

  

100mm quartz wafer holder

Specimen

  

Max. 100mm wafers, small pieces allowed

Responsible person

  

Roald van der Kolk

R.J.H. van der Kolk@tudelft.nl

+31 634321301

 

Charles de Boer (back-up)

c.r.deboer@tudelft.nl

+31 652169001

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