Veeco - Fiji G2 ALD
Apparatus |
| Veeco Fiji G2 |
Supplier | Veeco, https://www.veeco.com/ | |
Location | P.00.350 | |
Function | Atomic Layer Deposition | |
Gasses | SF6 , H2, NH3, O2 and Ns | |
| RF sources | ICP source for plasma assistend ALD | |
| Substrate temperature: | 20oC-500oC | |
| System layout: | Main chamber and load lock with separate pumping | |
| Chuck: | Metal chuck, no clamping | |
Process information | Thermal and plasma assissted ALD of TiN, NbN and NbTiN | |
Facilities | BIAS chuck, ellipsometer optional | |
Specimen | max. 100mm wafers, small pieces allowed | |
Equipment owner | Bas van Asten +31 642481091
Marinus Fischer (back-up) +31 628906207 | |